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Proceedings Paper

Targeted removal of metallic contamination from lithography solvents using membrane purifiers
Author(s): Aiwen Wu; Tetsu Kohyama; James Hamzik; Saksatha Ly; Jad Jaber
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Paper Abstract

Metal ions in photoresists and solvents pose an ever greater contamination problem in photolithography’s advanced applications. The reduction of metal contaminants is critical in the entire photochemical supply chain. In this paper we demonstrate that two novel membrane purifiers dramatically reduced the metal contents in a range of organic solvents. These solvents are used for photoresist manufacturing and for wafer surface and dispense line rinse in track tools. The impact of flow rate and metal concentrations in the feed on the metal removal efficiency of the purifiers is presented. Furthermore, a study to determine the dominant mechanism of metal reduction in solvents is proposed.

Paper Details

Date Published: 13 March 2018
PDF: 11 pages
Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 1058618 (13 March 2018); doi: 10.1117/12.2297395
Show Author Affiliations
Aiwen Wu, Entegris, Inc. (United States)
Tetsu Kohyama, Nihon Entegris K.K. (Japan)
James Hamzik, Entegris, Inc. (United States)
Saksatha Ly, Entegris, Inc. (United States)
Jad Jaber, Entegris, Inc. (United States)

Published in SPIE Proceedings Vol. 10586:
Advances in Patterning Materials and Processes XXXV
Christoph K. Hohle, Editor(s)

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