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An efficient way of layout processing based on calibre DRC and pattern matching for defects inspection application
Author(s): Helen Li; Robben Lee; Tyzy Lee; Teddy Xue; Hermes Liu; Hall Wu; Qijian Wan; Chunshan Du; Xinyi Hu; Zhengfang Liu
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Paper Abstract

As technology advances, escalating layout design complexity and chip size make defect inspection becomes more challenging than ever before. The YE (Yield Enhancement) engineers are seeking for an efficient strategy to ensure accuracy without suffering running time. A smart way is to set different resolutions for different pattern structures, for examples, logic pattern areas have a higher scan resolution while the dummy areas have a lower resolution, SRAM area may have another different resolution. This can significantly reduce the scan processing time meanwhile the accuracy does not suffer. Due to the limitation of the inspection equipment, the layout must be processed in order to output the Care Area marker in line with the requirement of the equipment, for instance, the marker shapes must be rectangle and the number of the rectangle shapes should be as small as possible. The challenge is how to select the different Care Areas by pattern structures, merge the areas efficiently and then partition them into pieces of rectangle shapes. This paper presents a solution based on Calibre DRC and Pattern Matching. Calibre equation-based DRC is a powerful layout processing engine and Calibre Pattern Matching’s automated visual capture capability enables designers to define these geometries as layout patterns and store them in libraries which can be re-used in multiple design layouts. Pattern Matching simplifies the description of very complex relationships between pattern shapes efficiently and accurately. Pattern matching’s true power is on display when it is integrated with normal DRC deck. In this application of defects inspection, we first run Calibre DRC to get rule based Care Area then use Calibre Pattern Matching’s automated pattern capture capability to capture Care Area shapes which need a higher scan resolution with a tune able pattern halo. In the pattern matching step, when the patterns are matched, a bounding box marker will be output to identify the high resolution area. The equation-based DRC and Pattern Matching effectively work together for different scan phases.

Paper Details

Date Published: 20 March 2018
PDF: 6 pages
Proc. SPIE 10588, Design-Process-Technology Co-optimization for Manufacturability XII, 105880Y (20 March 2018); doi: 10.1117/12.2297349
Show Author Affiliations
Helen Li, SMIC (China)
Robben Lee, SMIC (China)
Tyzy Lee, SMIC (China)
Teddy Xue, SMIC (China)
Hermes Liu, SMIC (China)
Hall Wu, SMIC (China)
Qijian Wan, Mentor Graphics Corp. (China)
Chunshan Du, Mentor Graphics Corp. (China)
Xinyi Hu, Mentor Graphics Corp. (China)
Zhengfang Liu, Mentor Graphics Corp. (China)


Published in SPIE Proceedings Vol. 10588:
Design-Process-Technology Co-optimization for Manufacturability XII
Jason P. Cain, Editor(s)

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