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Proceedings Paper

Defect dynamics in directed self-assembly of block copolymers (Conference Presentation)
Author(s): Tsukasa Azuma; Yuriko Seino; Hironobu Sato; Yusuke Kasahara; Katsuyoshi Kodera; Ken Miyagi; Masayuki Shiraishi; Ryota Matsuki; Terumasa Kosaka; Toshiyuki Himi; Seiji Nagahara; Alvin Chandra; Ryuichi Nakatani; Teruaki Hayakawa; Kenji Yoshimoto; Takuya Omosu; Mikihito Takenaka

Paper Abstract

Directed self-assembly (DSA) of block copolymers (BCPs) is a lithographic technique that is expected to be mutually complimentary with ArF immersion lithography, EUV lithography, electron beam direct writing, or nanoimprint for sub-15 nm line patterning and sub-20 nm contact hole patterning. Defect mitigation is the primary challenge behind the use of DSA lithography in practical applications in advanced semiconductor device manufacturing. Therefore, resolve this issue, defect dynamics needs to be clarified using in-situ measurements of self-assembling processes of BCPs in conjunction with modeling approaches. In this work, the evolution of a surface morphology in self-assembling processes of BCPs during annealing was investigated using in-situ atomic force microscope (AFM).5 A JPK NanoWizard ULTRA Speed AFM (JPK Instruments AG) under AC mode (lock-in phase signal image) was employed to carry out in-situ measurements of self-assembling of symmetrical polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) thin films with a thickness of 40 nm, and a domain spacing 30 nm domain spacing (L0) of 30 nm on a 5 nm thick neutral layer (PS-r-PMMA) during the thermal annealing process starting from a disordered as-cast state. The COOrdinated Line epitaxy (COOL) process was applied to provide DSA line multiplication patterns as hybrid guide patterns which act as chemical and physical epitaxy process. The in-situ observation approach of the surface morphology during micro-phase separation process revealed the defect generation and rectification processes in DSA thin films. A combination of the time development data in the in-situ AFM and grazing-incidence small-angle X-ray scattering (GI-SAXS) will also be discussed to develop a kinetic modeling for predicting dynamical changes in the three-dimensional nanostructures.

Paper Details

Date Published: 19 March 2018
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Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105860S (19 March 2018); doi: 10.1117/12.2297310
Show Author Affiliations
Tsukasa Azuma, EUVL Infrastructure Development Ctr., Inc. (Japan)
Yuriko Seino, EUVL Infrastructure Development Ctr., Inc. (Japan)
Hironobu Sato, EUVL Infrastructure Development Ctr., Inc. (Japan)
Yusuke Kasahara, EUVL Infrastructure Development Ctr., Inc. (Japan)
Katsuyoshi Kodera, EUVL Infrastructure Development Ctr., Inc. (Japan)
Ken Miyagi, EUVL Infrastructure Development Ctr., Inc. (Japan)
Masayuki Shiraishi, EUVL Infrastructure Development Ctr., Inc. (Japan)
Ryota Matsuki, EUVL Infrastructure Development Ctr., Inc. (Japan)
Terumasa Kosaka, EUVL Infrastructure Development Ctr., Inc. (Japan)
Toshiyuki Himi, EUVL Infrastructure Development Ctr., Inc. (Japan)
Seiji Nagahara, EUVL Infrastructure Development Ctr., Inc. (Japan)
Alvin Chandra, Tokyo Institute of Technology (Japan)
Ryuichi Nakatani, Tokyo Institute of Technology (Japan)
Teruaki Hayakawa, Tokyo Institute of Technology (Japan)
Kenji Yoshimoto, Kyoto Univ. (Japan)
Takuya Omosu, Kyoto Univ. (Japan)
Mikihito Takenaka, Kyoto Univ. (Japan)


Published in SPIE Proceedings Vol. 10586:
Advances in Patterning Materials and Processes XXXV
Christoph K. Hohle, Editor(s)

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