Share Email Print

Proceedings Paper

Feed-forward alignment correction for advanced overlay process control using a standalone alignment station "Litho Booster"
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

One of the main components of an On-Product Overlay (OPO) error budget is the process induced wafer error. This necessitates wafer-to-wafer correction in order to optimize overlay accuracy. This paper introduces the Litho Booster (LB), standalone alignment station as a solution to improving OPO. LB can execute high speed alignment measurements without throughput (THP) loss. LB can be installed in any lithography process control loop as a metrology tool, and is then able to provide feed-forward (FF) corrections to the scanners. In this paper, the detailed LB design is described and basic LB performance and OPO improvement is demonstrated. Litho Booster’s extendibility and applicability as a solution for next generation manufacturing accuracy and productivity challenges are also outlined

Paper Details

Date Published: 13 March 2018
PDF: 10 pages
Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105852Z (13 March 2018); doi: 10.1117/12.2297300
Show Author Affiliations
Takehisa Yahiro, Nikon Corp. (Japan)
Junpei Sawamura, Nikon Corp. (Japan)
Tomonori Dosho, Nikon Corp. (Japan)
Yuji Shiba, Nikon Corp. (Japan)
Satoshi Ando, Nikon Corp. (Japan)
Jun Ishikawa, Nikon Corp. (Japan)
Masahiro Morita, Nikon Corp. (Japan)
Yuichi Shibazaki, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 10585:
Metrology, Inspection, and Process Control for Microlithography XXXII
Vladimir A. Ukraintsev, Editor(s)

© SPIE. Terms of Use
Back to Top