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Proceedings Paper

Constraint approaches for some inverse lithography problems with pixel-based mask
Author(s): Sergey Kobelkov; Victoria Roizen; Sergei Rodin; Alexander Tritchkov; JiWan Han; Yuri Granik
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Paper Abstract

An approach of solving the inverse lithography problem as a nonlinear, constrained minimization problem over a domain of mask pixels was suggested in the paper by Yu. Granik "Fast pixel-based mask optimization for inverse lithography'' in 2006.

This idea was advanced to account for pinching and bridging print contour constraints in the paper "Controlling Bridging and Pinching with Pixel-based Mask for Inverse Lithograph'' by S. Kobelkov and others in 2015.

The present paper extends this approach further for solving the enclosure print image constraints, getting maximum common depth of focus, and obtaining uniform PV-bands.

Namely, we suggest several objective functions that express penalty for constraint violations. Their minimization with gradient descent methods is considered. A number of applications have been tested with ILTbased pxOPC tool for DUV metal, contacts, and EUV metal layouts; results are discussed showing benefits of each approach.

Paper Details

Date Published: 20 March 2018
PDF: 7 pages
Proc. SPIE 10587, Optical Microlithography XXXI, 105870I (20 March 2018); doi: 10.1117/12.2297262
Show Author Affiliations
Sergey Kobelkov, Mentor Graphics Corp. (United States)
Victoria Roizen, Mentor Graphics Corp. (United States)
Sergei Rodin, Mentor Graphics Corp. (United States)
Alexander Tritchkov, Mentor Graphics Corp. (United States)
JiWan Han, Mentor Graphics Corp. (United States)
Yuri Granik, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 10587:
Optical Microlithography XXXI
Jongwook Kye, Editor(s)

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