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Proceedings Paper

A novel processing platform for post tape out flows
Author(s): Hien T. Vu; Soohong Kim; James Word; Lynn Y. Cai
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Paper Abstract

As the computational requirements for post tape out (PTO) flows increase at the 7nm and below technology nodes, there is a need to increase the scalability of the computational tools in order to reduce the turn-around time (TAT) of the flows. Utilization of design hierarchy has been one proven method to provide sufficient partitioning to enable PTO processing. However, as the data is processed through the PTO flow, its effective hierarchy is reduced. The reduction is necessary to achieve the desired accuracy. Also, the sequential nature of the PTO flow is inherently non-scalable. To address these limitations, we are proposing a quasi-hierarchical solution that combines multiple levels of parallelism to increase the scalability of the entire PTO flow. In this paper, we describe the system and present experimental results demonstrating the runtime reduction through scalable processing with thousands of computational cores.

Paper Details

Date Published: 20 March 2018
PDF: 6 pages
Proc. SPIE 10587, Optical Microlithography XXXI, 105870R (20 March 2018); doi: 10.1117/12.2297240
Show Author Affiliations
Hien T. Vu, Mentor Graphics Corp. (United States)
Soohong Kim, Mentor Graphics Corp. (United States)
James Word, Mentor Graphics Corp. (United States)
Lynn Y. Cai, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 10587:
Optical Microlithography XXXI
Jongwook Kye, Editor(s)

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