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Proceedings Paper

Cross-MEEF assisted SRAF print avoidance approach
Author(s): Vlad Liubich; William Brown; George Lippincott; Rui Wu
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Paper Abstract

Sub-resolution assist features (SRAFs) have become an integral part of low-k lithography’s resolution enhancement techniques (RET). Gradually maturing EUV technology indicates that SRAF insertion might be necessary for 5nm technology nodes and below.

In mask synthesis flows, during the correction step, an SRAF print avoidance (SPA) algorithm is relying on detection of printing predicted by model based simulation. In this paper we are presenting a cross-MEEF based SPA approach that offers elimination of SRAF printing while minimizing impact on process window.

Paper Details

Date Published: 20 March 2018
PDF: 6 pages
Proc. SPIE 10588, Design-Process-Technology Co-optimization for Manufacturability XII, 105880T (20 March 2018); doi: 10.1117/12.2297227
Show Author Affiliations
Vlad Liubich, Mentor Graphics Corp. (United States)
William Brown, Mentor Graphics Corp. (United States)
George Lippincott, Mentor Graphics Corp. (United States)
Rui Wu, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 10588:
Design-Process-Technology Co-optimization for Manufacturability XII
Jason P. Cain, Editor(s)

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