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Proceedings Paper

Application specific ratings of filters for negative-tone developer
Author(s): Toru Umeda; Yukihisa Kawada; Kazushi Masuda; Naoya Iguchi; Tetsuya Murakami; Shuichi Tsuzuki
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Paper Abstract

Negative tone development is being employed widely because of its superior resolution. Pall is developing filtration products specially targeted for these high resolution applications. High particle retention and low extractables are key aspects of filtration products known to improve on-wafer defectivity. In the current study, we have found that filtration efficiency of the various filter types towards palladium-heptylamine nanoparticles correlates strongly to actual particle removal determined by on-wafer inspection metrology. Furthermore, using the afore mentioned nanoparticle testing metrology, high retention membranes with low extractables were selected. Particle challenge testing is much simpler than on-wafer defectivity inspection and enables faster and effective filtration membrane selection. Based on these results, the selected filtration membrane is expected to perform effective real particle removal in negative tone developer.

Paper Details

Date Published: 13 March 2018
PDF: 6 pages
Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 1058616 (13 March 2018); doi: 10.1117/12.2297164
Show Author Affiliations
Toru Umeda, Nihon Pall Ltd. (Japan)
Yukihisa Kawada, FUJIFILM Electronic Materials Co., Ltd. (Japan)
Kazushi Masuda, FUJIFILM Electronic Materials Co., Ltd. (Japan)
Naoya Iguchi, FUJIFILM Corp. (Japan)
Tetsuya Murakami, Nihon Pall Ltd. (Japan)
Shuichi Tsuzuki, Nihon Pall Ltd. (Japan)


Published in SPIE Proceedings Vol. 10586:
Advances in Patterning Materials and Processes XXXV
Christoph K. Hohle, Editor(s)

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