Share Email Print
cover

Proceedings Paper • new

Unique method for controlling device level overlay with high-NA optical overlay technique using YieldStar in a DRAM HVM environment
Author(s): Dong-Kiu Park; Hyun-Sok Kim; Moo-Young Seo; Jae-Wuk Ju; Young-Sik Kim; Mir Shahrjerdy; Arno van Leest; Aileen Soco; Giacomo Miceli; Jennifer Massier; Elliott McNamara; Paul Hinnen; Paul Böcker; Nang-Lyeom Oh; Sang-Hoon Jung; Yvon Chai; Jun-Hyung Lee
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper demonstrates the improvement using the YieldStar S-1250D small spot, high-NA, after-etch overlay in-device measurements in a DRAM HVM environment. It will be demonstrated that In-device metrology (IDM) captures after-etch device fingerprints more accurately compared to the industry-standard CDSEM. Also, IDM measurements (acquiring both CD and overlay) can be executed significantly faster increasing the wafer sampling density that is possible within a realistic metrology budget. The improvements to both speed and accuracy open the possibility of extended modeling and correction capabilities for control. The proof-book data of this paper shows a 36% improvement of device overlay after switching to control in a DRAM HVM environment using indevice metrology.

Paper Details

Date Published: 13 March 2018
PDF: 9 pages
Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105850V (13 March 2018); doi: 10.1117/12.2297094
Show Author Affiliations
Dong-Kiu Park, SK hynix, Inc. (Korea, Republic of)
Hyun-Sok Kim, SK hynix, Inc. (Korea, Republic of)
Moo-Young Seo, SK hynix, Inc. (Korea, Republic of)
Jae-Wuk Ju, SK hynix, Inc. (Korea, Republic of)
Young-Sik Kim, SK hynix, Inc. (Korea, Republic of)
Mir Shahrjerdy, ASML Netherlands B.V. (Netherlands)
Arno van Leest, ASML Netherlands B.V. (Netherlands)
Aileen Soco, ASML Netherlands B.V. (Netherlands)
Giacomo Miceli, ASML Netherlands B.V. (Netherlands)
Jennifer Massier, ASML Netherlands B.V. (Netherlands)
Elliott McNamara, ASML Netherlands B.V. (Netherlands)
Paul Hinnen, ASML Netherlands B.V. (Netherlands)
Paul Böcker, ASML Netherlands B.V. (Netherlands)
Nang-Lyeom Oh, ASML Korea Co., Ltd. (Korea, Republic of)
Sang-Hoon Jung, ASML Korea Co., Ltd. (Korea, Republic of)
Yvon Chai, ASML Korea Co., Ltd. (Korea, Republic of)
Jun-Hyung Lee, ASML Korea Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 10585:
Metrology, Inspection, and Process Control for Microlithography XXXII
Vladimir A. Ukraintsev, Editor(s)

© SPIE. Terms of Use
Back to Top