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Improved airborne molecular contaminant filter performance for photolithography
Author(s): Gerald Weineck; Brian Hoang; Joshua Lais
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Paper Abstract

Airborne molecular contaminants continue to pose cost of ownership challenges in photolithography. Recent advances in understanding siloxane removal have led to the development of an innovative filtration configuration utilizing new media that works in concert to increase overall filter life for acids, bases and silicon containing organic contaminants. This paper examines accelerated testing results, for these state-of-the-art filtration assemblies versus legacy products, to demonstrate improved system performance. The state-of-the-art filtration assemblies have been evaluated in production semiconductor fabs and have shown favorable performance.

Paper Details

Date Published: 13 March 2018
PDF: 10 pages
Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 105861A (13 March 2018); doi: 10.1117/12.2297034
Show Author Affiliations
Gerald Weineck, Donaldson Co., Inc. (United States)
Brian Hoang, Donaldson Co., Inc. (United States)
Joshua Lais, Donaldson Co., Inc. (United States)

Published in SPIE Proceedings Vol. 10586:
Advances in Patterning Materials and Processes XXXV
Christoph K. Hohle, Editor(s)

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