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Hybrid hotspot library building based on optical and geometry analysis at early stage for new node development
Author(s): Ying Chen; Tianyang Gai; Xiaojing Su; Yayi Wei; Yajuan Su; Tianchun Ye
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Paper Abstract

As the semiconductor industry enters 20 nm node and beyond, design restrictions and process complexity lay stress on the development for a new technology node. This paper introduces a hybrid hotspot library building method based on simultaneous optical and geometry analysis, which could help explore design rule optimization and enhance cycle time at early stage for new node development. Lithography simulation results verify the accuracy of this method. This method provide a feasible way to build up a preliminary Design Rule Checking (DRC) library even before process-freezing.

Paper Details

Date Published: 20 March 2018
PDF: 7 pages
Proc. SPIE 10588, Design-Process-Technology Co-optimization for Manufacturability XII, 1058811 (20 March 2018); doi: 10.1117/12.2296834
Show Author Affiliations
Ying Chen, Institute of Microelectronics (China)
Univ. of Chinese Academy of Sciences (China)
Tianyang Gai, Institute of Microelectronics (China)
Univ. of Chinese Academy of Sciences (China)
Xiaojing Su, Institute of Microelectronics (China)
Yayi Wei, Institute of Microelectronics (China)
Univ. of Chinese Academy of Sciences (China)
Yajuan Su, Institute of Microelectronics (China)
Tianchun Ye, Institute of Microelectronics (China)
Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 10588:
Design-Process-Technology Co-optimization for Manufacturability XII
Jason P. Cain, Editor(s)

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