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Proceedings Paper

Overlay control for 7nm technology node and beyond
Author(s): Nyan Aung; Woong Jae Chung; Pavan Samudrala; Haiyong Gao; Wenle Gao; Darius Brown; Guanchen He; Bono Park; Michael Hsieh; Xueli Hao; Yen-Jen Chen; Yue Zhou; DeNeil Park; Karsten Gutjahr; Ian Krumanocker; Kevin Jock; Juan Manuel Gomez
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Paper Abstract

We demonstrate high volume manufacturing feasibility of 7 nm technology overlay correction requirement. This stateof- the-art overlay control is achieved by (i) overlay sampling optimization and advanced modeling, (ii) alignment and advanced process control optimization, (iii) multiple target overlay optimization, and (iv) heating control. We will also discuss further improvements in overlay control for 7 nm technology node and beyond including computational metrology, extreme ultraviolet and optic tools overlay matching control, high order alignment correction, tool stability improvement, and advanced heating control.

Paper Details

Date Published: 20 March 2018
PDF: 12 pages
Proc. SPIE 10587, Optical Microlithography XXXI, 105870A (20 March 2018); doi: 10.1117/12.2295828
Show Author Affiliations
Nyan Aung, GLOBALFOUNDRIES Inc. (United States)
Woong Jae Chung, GLOBALFOUNDRIES Inc. (United States)
Pavan Samudrala, GLOBALFOUNDRIES Inc. (United States)
Haiyong Gao, GLOBALFOUNDRIES Inc. (United States)
Wenle Gao, GLOBALFOUNDRIES Inc. (United States)
Darius Brown, GLOBALFOUNDRIES Inc. (United States)
Guanchen He, GLOBALFOUNDRIES Inc. (United States)
Bono Park, GLOBALFOUNDRIES Inc. (United States)
Michael Hsieh, GLOBALFOUNDRIES Inc. (United States)
Xueli Hao, GLOBALFOUNDRIES Inc. (United States)
Yen-Jen Chen, GLOBALFOUNDRIES Inc. (United States)
Yue Zhou, GLOBALFOUNDRIES Inc. (United States)
DeNeil Park, GLOBALFOUNDRIES Inc. (United States)
Karsten Gutjahr, GLOBALFOUNDRIES Inc. (United States)
Ian Krumanocker, GLOBALFOUNDRIES Inc. (United States)
Kevin Jock, GLOBALFOUNDRIES Inc. (United States)
Juan Manuel Gomez, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 10587:
Optical Microlithography XXXI
Jongwook Kye, Editor(s)

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