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R2R fabrication of freeform micro-optics (Conference Presentation)
Author(s): Ursula Palfinger; Ladislav Kuna; Dieter Nees; Stephan Ruttloff; Johannes Götz; Barbara Stadlober
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Paper Abstract

Roll-to-roll UV nanoimprint lithography (R2R-UV-NIL) gains increasing industrial interest for large-area nano- and microstructuring of flexible substrates. It combines the possibility of multi length scale and 2.5D patterning of a functional resist with a square meter per minute productivity. The fabrication of micro- and nanooptic elements and systems nowadays can be named a classical application of batch NIL. However, large-area application fields like display, photovoltaics or solar cell markets ask for upscaling possibilities with respect to active area and throughput. The combination of direct laser lithography, step+repeat imprinting for shim fabrication and R2R reproduction even offers a much higher diversity of application fields. Free form lenses and mirrors, waveguiding units or complex light manipulating systems add new possibilities for customized photonic systems, security features or large area high-end decoration. Within this talk we will present the possibilities of combining greyscale laser lithography and roller-based imprinting with functionalized high-k imprint resins and see how to produce meters-per-minute 2.5D optical features on flexible substrates.

Paper Details

Date Published: 14 March 2018
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Proc. SPIE 10520, Laser-based Micro- and Nanoprocessing XII, 105200J (14 March 2018); doi: 10.1117/12.2295784
Show Author Affiliations
Ursula Palfinger, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)
Ladislav Kuna, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)
Dieter Nees, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)
Stephan Ruttloff, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)
Johannes Götz, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)
Barbara Stadlober, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)


Published in SPIE Proceedings Vol. 10520:
Laser-based Micro- and Nanoprocessing XII
Udo Klotzbach; Kunihiko Washio; Rainer Kling, Editor(s)

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