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Proceedings Paper

Study on the calibration and optimization of double theodolites baseline
Author(s): Jing-yi Ma; Jin-ping Ni; Zhi-chao Wu
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Paper Abstract

For the double theodolites measurement system baseline as the benchmark of the scale of the measurement system and affect the accuracy of the system, this paper puts forward a method for calibration and optimization of the double theodolites baseline. Using double theodolites to measure the known length of the reference ruler, and then reverse the baseline formula. Based on the error propagation law, the analyses show that the baseline error function is an important index to measure the accuracy of the system, and the reference ruler position, posture and so on have an impact on the baseline error. The optimization model is established and the baseline error function is used as the objective function, and optimizes the position and posture of the reference ruler. The simulation results show that the height of the reference ruler has no effect on the baseline error; the posture is not uniform; when the reference ruler is placed at x=500mm and y=1000mm in the measurement space, the baseline error is the smallest. The experimental results show that the experimental results are consistent with the theoretical analyses in the measurement space. In this paper, based on the study of the placement of the reference ruler, for improving the accuracy of the double theodolites measurement system has a reference value.

Paper Details

Date Published: 12 January 2018
PDF: 12 pages
Proc. SPIE 10621, 2017 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 106211G (12 January 2018); doi: 10.1117/12.2295155
Show Author Affiliations
Jing-yi Ma, Xi'an Technological Univ. (China)
Shaanxi Province Key Lab. of Photoelectric Measurement and Instrument Technology (China)
Jin-ping Ni, Xi'an Technological Univ. (China)
Shaanxi Province Key Lab. of Photoelectric Measurement and Instrument Technology (China)
Zhi-chao Wu, Xi'an Technological Univ. (China)
Shaanxi Province Key Lab. of Photoelectric Measurement and Instrument Technology (China)


Published in SPIE Proceedings Vol. 10621:
2017 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
Jigui Zhu; Hwa-Yaw Tam; Kexin Xu; Hai Xiao; Liquan Dong, Editor(s)

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