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Proceedings Paper

Monitoring the thickness of ZnO films on iso-axis magnetron sputtering using laser
Author(s): Kecheng Xie
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Paper Abstract

The film thickness monitoring technology is one of the factors in film manufacture. In isoaxis magnetron sputtering, to detect the film thickness in real time is very important. This paper presented a method which can monitor the thickness of ZnO films in a simple, quick and accurate way as well as in real time. The method is to trace the substrates on a TCT-300 type isoaxis magnetron sputtering machine using laser directly. The sputtering machine is made in our institute.

Paper Details

Date Published: 1 July 1990
PDF: 2 pages
Proc. SPIE 1230, International Conference on Optoelectronic Science and Engineering '90, 12304H (1 July 1990); doi: 10.1117/12.2294798
Show Author Affiliations
Kecheng Xie, Sichuan Institute of Piezoelectric and Acousto-Optic Technology (China)


Published in SPIE Proceedings Vol. 1230:
International Conference on Optoelectronic Science and Engineering '90
DaHeng Wang, Editor(s)

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