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Proceedings Paper

Analysis of in-situ monitoring technique for fabrication of high quality diffraction gratings used in integrated optical circuits
Author(s): Jianping Xie
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Paper Abstract

In developing process of photoresist, high quality diffraction grating can be fabricated on GaAs substrate by in-situ monitoring the diffraction intensity from the photoresist. The diffraction intensity variation with development is analyzed, and the optimum end point of developing is indicated in this paper. The analyses are good coincident with the experiment results.

Paper Details

Date Published: 1 July 1990
PDF: 3 pages
Proc. SPIE 1230, International Conference on Optoelectronic Science and Engineering '90, 12300C (1 July 1990); doi: 10.1117/12.2294649
Show Author Affiliations
Jianping Xie, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 1230:
International Conference on Optoelectronic Science and Engineering '90
DaHeng Wang, Editor(s)

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