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Proceedings Paper

The need for line-edge roughness metrology standardization: the imec protocol
Author(s): Gian F. Lorusso; Takumichi Sutani ; Vito Rutigliani; Frieda Van Roey; Alain Moussa; Chris Mack; Patrick Naulleau; Vassilios Constantoudis ; Masami Ikota ; Toru Ishimoto; Shunsuke Koshihara
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Paper Details

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Proc. SPIE AL103, Metrology, Inspection, and Process Control for Microlithography XXXII, ; doi: 10.1117/12.2294617
Show Author Affiliations
Gian F. Lorusso, IMEC (Belgium)
Takumichi Sutani , Hitachi High-Technologies Corp. (Japan)
Vito Rutigliani, IMEC (Belgium)
Frieda Van Roey, IMEC (Belgium)
Alain Moussa, IMEC (Belgium)
Chris Mack, Fractilia , TX 78703, USA (United States)
Patrick Naulleau, Center for X-ray Optics, Lawrence Berkeley National Laboratory (United States)
Vassilios Constantoudis , Institute of Nanoscience and Nanotechnology NCSR Demokritos (Greece)
Masami Ikota , Hitachi High-Technologies Corp. (Japan)
Toru Ishimoto, Hitachi High-Technologies Corp. (Japan)
Shunsuke Koshihara, Hitachi High-Technologies Corp. (Japan)


Published in SPIE Proceedings Vol. AL103:
Metrology, Inspection, and Process Control for Microlithography XXXII
Vladimir A. Ukraintsev, Editor(s)

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