Share Email Print

Proceedings Paper

Measurements of UV induced absorption in dielectric coatings
Author(s): M. H. Bakshi
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We discuss the first results obtained from a new testing fa- cility for measuring the induced absorption in multilayer dielec- tric coatings exposed to intense UV radiation. The absorption loss is measured in-situ during exposure, as a function of time for var- ious UV photon energies, intensities, and sample materials. The sample is irradiated by the direct beam from the TOK undulator at NSLS and measured in-vacuo. The undulator is typically run at K = 1 (so that the harmonic emission is low) to simplify the data anal- ysis. The test chamber is separated from the undulator beamline by a differentially pumped line which permits the introduction of car- bonaceous gases into the chamber at pressures up to 10-5 Torr. By varying the current and energy of the stored electrons, one can ad- just the intensity and photon energy of the undulator first harmonic in the range up to 1.2 w/cm2, and between about 5 eV and 35 eV.

Paper Details

Date Published: 1 November 1990
PDF: 10 pages
Proc. SPIE 1438, Laser-Induced Damage in Optical Materials 1989, 14381G (1 November 1990); doi: 10.1117/12.2294461
Show Author Affiliations
M. H. Bakshi, Brookhaven National Lab. (United States)

Published in SPIE Proceedings Vol. 1438:
Laser-Induced Damage in Optical Materials 1989
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

© SPIE. Terms of Use
Back to Top