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Proceedings Paper

A high temperature, plasma-assisted chemical vapor deposition system
Author(s): R. M. Brusasco
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Paper Abstract

We have designed and built a high-temperature, plasma-assisted, chemical vapor deposition system to deposit multilayer optical coatings of SiO2 and doped-SiO2 on flat substrates. The coater concept and design is an outgrowth of our recent work with Schott Glaswerke demonstrating the use of plasma assisted CVD to prepare very high damage threshold optical coatings. (That work is reported in a companion paper at this Symposium).

Paper Details

Date Published: 1 November 1990
PDF: 12 pages
Proc. SPIE 1438, Laser-Induced Damage in Optical Materials 1989, 143818 (1 November 1990); doi: 10.1117/12.2294453
Show Author Affiliations
R. M. Brusasco, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 1438:
Laser-Induced Damage in Optical Materials 1989
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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