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Angular dependence of thin-film dielectric coating damage thresholds revisited
Author(s): J. D. Boyer
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Paper Abstract

Newnam et al. [1] reported experiments showing that the angular dependence of 351-nm laser damage thresholds in HfO2/SiO2 multilayer dielectric reflectors was much weaker than even the 1/cosh expected from simple geometric fluence dilution. Several plausible explanations were suggested, but none were convincing. We propose a simple geometric model based on a cylindrical form for the coating defect responsible for damage initiation. We have measured 248-nm damage thresholds for bare fused silica, evaporated aluminium films, and HfO2/SiO2 and A1203/SiO2 dielectric reflectors at angles out to 85°. The measured data agree well with our simple model.

Paper Details

Date Published: 2 October 2017
PDF: 8 pages
Proc. SPIE 1438, Laser-Induced Damage in Optical Materials 1989, 143815 (2 October 2017); doi: 10.1117/12.2294450
Show Author Affiliations
J. D. Boyer, Los Alamos National Lab. (United States)


Published in SPIE Proceedings Vol. 1438:
Laser-Induced Damage in Optical Materials 1989
Harold E. Bennett; Lloyd L. Chase; Arthur H. Guenther; Brian Emerson Newnam; M. J. Soileau, Editor(s)

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