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Proceedings Paper

Fabrication and performance of optical-interconnect analog-phase holograms made by electron-beam lithography
Author(s): Paul D. Maker; Daniel W. Wilson; Richard E. Muller
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Paper Abstract

Free space optical interconnect phase holograms fabricated in poly-methyl methacrylate films by direct-write electron beam lithography have been characterized both physically and optically. Performance of holograms containing common fabrication errors is simulated using both Fourier optics and, for a simple one dimensional hologram, a numerical solution of the Helmholtz equation. The degradation of optical performance due to measured fabrication errors and design errors is discussed in view of the simulation results.

Paper Details

Date Published: 30 January 1996
PDF: 16 pages
Proc. SPIE 10284, Optoelectronic Interconnects and Packaging: A Critical Review, 102840O (30 January 1996); doi: 10.1117/12.229275
Show Author Affiliations
Paul D. Maker, Jet Propulsion Lab. (United States)
Daniel W. Wilson, Jet Propulsion Lab. (United States)
Richard E. Muller, Jet Propulsion Lab. (United States)

Published in SPIE Proceedings Vol. 10284:
Optoelectronic Interconnects and Packaging: A Critical Review
Ray T. Chen; Peter S. Guilfoyle, Editor(s)

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