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Proceedings Paper

Suppression of ablation by double-pulse femtosecond laser irradiation
Author(s): Masaki Hashida; Shinichiro Masuno; Yuki Furukawa; Shogo Nishino; Mitsuhiro Kusaba; Shunsuke Inoue; Shuji Sakabe; Hitoshi Sakagami; Masahiro Tsukamoto
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Paper Abstract

We have demonstrated the suppression of ablation rate on a silicon surface irradiated by a double-pulse beam with two color laser in time delays of Δt = -900 - 900 ps. The double pulse beam consists of 810nm with 40fs pulse and 405nm with > 40fs pulse. The fundamental-pulse fluence F810 is kept below ablation threshold (Fth, 810nm = 0.190 J/cm2 ) while the second harmonic pulse fluence F405 are kept above the ablation threshold (Fth, 405nm = 0.050 J/cm2 ). We find that ablation rate of silicon is drastically decreased at delay times of 600ps.

Paper Details

Date Published: 19 February 2018
PDF: 6 pages
Proc. SPIE 10522, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVIII, 105220S (19 February 2018); doi: 10.1117/12.2291229
Show Author Affiliations
Masaki Hashida, Kyoto Univ. (Japan)
Shinichiro Masuno, Kyoto Univ. (Japan)
Osaka Univ. (Japan)
Yuki Furukawa, Kyoto Univ. (Japan)
Shogo Nishino, Kyoto Univ. (Japan)
Mitsuhiro Kusaba, Osaka Sangyo Univ. (Japan)
Shunsuke Inoue, Kyoto Univ. (Japan)
Shuji Sakabe, Kyoto Univ. (Japan)
Hitoshi Sakagami, National Institute for Fusion Science (Japan)
Masahiro Tsukamoto, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 10522:
Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVIII
Peter R. Herman; Michel Meunier; Roberto Osellame, Editor(s)

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