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Proceedings Paper

Polarization-independent dielectric metasurface for mid-infrared applications
Author(s): Mostafa Abdelsalam; Ahmed M. Mahmoud; Mohamed Swillam
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Paper Abstract

Metamaterials (MMs) are composite structures that exhibit non-conventional optical properties. Conventional threedimensional MMs are rather bulky, usually require complicated fabrication techniques and are not CMOS technology compatible. On the other hand, there has been a great ongoing interest in two-dimensional Metamaterials (Metasurfaces). Metasurfaces are two dimensional periodic structures that allow controllable change in the amplitude and phase of the incoming wave upon interaction that allows for designing ultrathin optical components with various functionalities. This can be achieved through optical resonances through the metasurface. These resonances can be achieved either through plasmonic antennae or dielectric resonators. Due to their lossy nature in the optical domain, plasmonic and metallic based metasurfaces can lead to inefficient operation and limit the applicability of such structures. In this work we discuss an all silicon metasurface design using cross-shaped unit cells. This cross design in addition to being polarization insensitive is capable of achieving phase difference from 0 to 2π by optimizing two degrees of freedom and thus offers a promising platform for various metasurface applications. We show through numerical simulations the properties of this polarization independent design and how it can be used for mid-infrared beam steering and lensing applications.

Paper Details

Date Published: 21 February 2018
PDF: 7 pages
Proc. SPIE 10542, High Contrast Metastructures VII, 105421D (21 February 2018); doi: 10.1117/12.2290953
Show Author Affiliations
Mostafa Abdelsalam, American Univ. in Cairo (Egypt)
Ahmed M. Mahmoud, American Univ. in Cairo (Egypt)
Mohamed Swillam, American Univ. in Cairo (Egypt)


Published in SPIE Proceedings Vol. 10542:
High Contrast Metastructures VII
Connie J. Chang-Hasnain; Andrei Faraon; Fumio Koyama; Weimin Zhou, Editor(s)

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