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Proceedings Paper

TruMicro 7380: advancements in high-power UV nanosecond disk lasers (Conference Presentation)
Author(s): Florian Kanal; Max Kahmann; Veit Angrick; Montasser Bouzid; Wolfgang Schüle; Christian Stolzenburg
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Paper Abstract

Based on the thin-disk laser architecture, TRUMPF has been developing and building high-power cw lasers for over two decades. The short pulse thin-disk lasers of the TruMicro 7000 series are employed in a wide range of industrial applications as well. With different wavelengths and pulse energies, the TruMicro 7000 series enables processes like cutting, structuring, and ablation of many materials. Recently, TRUMPF introduced short pulsed UV lasers based on a disk laser medium for applications requiring high average powers in combination with nanosecond pulse lengths. With 180 W of average output power the TruMicro 7370 combines the highest average power of a solid-state laser with UV output and pulse energies of 18 mJ. With the solid-state platform, the lifetime is significantly increased compared to excimer lasers typically used for high power UV nanosecond applications. Here, we present the latest development of this laser platform allowing for an increase of the laser power up to 400 W and the pulse energy to 40 mJ employing a cascading scheme for third-harmonic generation. By accessing TRUMPF’s elaborated disk-laser expertise, the new UV nanosecond laser TruMicro 7380 also provides enhanced pulse energy stability. All these benefits of these short-pulse solid-state UV laser are predestining this platform for large-area applications as e. g. laser-lift-off of flexible OLED displays where average power and pulse energy can be translated into productivity by means of line-beam optics. The possibility of synchronizing up to twelve of these laser devices allows for even higher productivities.

Paper Details

Date Published: 14 March 2018
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Proc. SPIE 10511, Solid State Lasers XXVII: Technology and Devices, 105110M (14 March 2018); doi: 10.1117/12.2290353
Show Author Affiliations
Florian Kanal, TRUMPF Laser- und Systemtechnik GmbH (Germany)
Max Kahmann, TRUMPF Laser- und Systemtechnik GmbH (Germany)
Veit Angrick, TRUMPF Laser GmbH (Germany)
Montasser Bouzid, TRUMPF Laser GmbH (Germany)
Wolfgang Schüle, TRUMPF Laser GmbH (Germany)
Christian Stolzenburg, TRUMPF Laser GmbH (Germany)


Published in SPIE Proceedings Vol. 10511:
Solid State Lasers XXVII: Technology and Devices
W. Andrew Clarkson; Ramesh K. Shori, Editor(s)

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