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Proceedings Paper

Optimization for high speed surface processing of metallic surfaces utilizing direct laser interference patterning
Author(s): Valentin Lang; Tim Hoffmann; Andrés Fabián Lasagni
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Paper Abstract

Direct Laser Interference Structuring (DLIP) is a manufacturing technology capable to functionalize large areas with high-precision periodic patterns. However, for industrial use of this emerging technology, solutions must be developed for specific requirements. With the objective of optimizing Direct Laser Interference Patterning in terms of process speed, an advanced optical module was developed that permits to superimpose two laser beams obtaining the interference pattern within an elongated area (linear spot) to meet the requirements of high-speed processing. After that, the influence of the process parameters on the quality of the surface patterns produced with the developed optical assembly was determined. It could be shown that the pulse overlap, in contrast to the applied average fluence, has a significant influence on the resulting structure heights of the produced patterns. Furthermore, it became apparent that during the course of the process, the underlying physical process dynamics seem to change, which was indicated by the resulting structure heights variations over the process. The gained findings will make a contribution to improving the quality of surface patterns produced with DLIP and to enabling reliable manufacturing qualities in the future.

Paper Details

Date Published: 19 February 2018
PDF: 9 pages
Proc. SPIE 10520, Laser-based Micro- and Nanoprocessing XII, 105200K (19 February 2018); doi: 10.1117/12.2290320
Show Author Affiliations
Valentin Lang, TU Dresden (Germany)
Fraunhofer Institut fur Werstoff- und Strahltechnik (Germany)
Tim Hoffmann, Fraunhofer Institut fur Werkstoff- und Strahltechnik (Germany)
Andrés Fabián Lasagni, TU Dresden (Germany)
Fraunhofer Institut fur Werstoff- und Strahltechnik (Germany)


Published in SPIE Proceedings Vol. 10520:
Laser-based Micro- and Nanoprocessing XII
Udo Klotzbach; Kunihiko Washio; Rainer Kling, Editor(s)

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