Share Email Print

Proceedings Paper • new

Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications
Author(s): D. Opalevs; M. Scholz; J. Stuhler; C. Gilfert; L. J. Liu; X. Y. Wang; A. Vetter; R. Kirner; T. Scharf; W. Noell; C. Rockstuhl; R. K. Li; C. T. Chen; R. Voelkel; P. Leisching
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We present a novel industrial-grade prototype version of a continuous-wave 193 nm laser system entirely based on solid state pump laser technology. Deep-ultraviolet emission is realized by frequency-quadrupling an amplified diode laser and up to 20 mW of optical power were generated using the nonlinear crystal KBBF. We demonstrate the lifetime of the laser system for different output power levels and environmental conditions. The high stability of our setup was proven in > 500 h measurements on a single spot, a crystal shifter multiplies the lifetime to match industrial requirements. This laser improves the relative intensity noise, brilliance, wall-plug efficiency and maintenance cost significantly. We discuss first lithographic experiments making use of this improvement in photon efficiency.

Paper Details

Date Published: 15 February 2018
PDF: 6 pages
Proc. SPIE 10511, Solid State Lasers XXVII: Technology and Devices, 105112C (15 February 2018); doi: 10.1117/12.2290288
Show Author Affiliations
D. Opalevs, TOPTICA Photonics AG (Germany)
M. Scholz, TOPTICA Photonics AG (Germany)
J. Stuhler, TOPTICA Photonics AG (Germany)
C. Gilfert, TOPTICA Photonics AG (Germany)
L. J. Liu, Technical Institute of Physics and Chemistry (China)
X. Y. Wang, Technical Institute of Physics and Chemistry (China)
A. Vetter, Karlsruher Institut für Technologie (Germany)
SUSS MicroOptics SA (Switzerland)
R. Kirner, SUSS MicroOptics SA (Switzerland)
T. Scharf, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
W. Noell, SUSS MicroOptics SA (Switzerland)
C. Rockstuhl, Karlsruher Institut für Technologie (Germany)
R. K. Li, Technical Institute of Physics and Chemistry (China)
C. T. Chen, Technical Institute of Physics and Chemistry (China)
R. Voelkel, SUSS MicroOptics SA (Switzerland)
P. Leisching, TOPTICA Photonics AG (Germany)

Published in SPIE Proceedings Vol. 10511:
Solid State Lasers XXVII: Technology and Devices
W. Andrew Clarkson; Ramesh K. Shori, Editor(s)

© SPIE. Terms of Use
Back to Top