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Enhanced ablation with a femtosecond-nanosecond dual-pulse
Author(s): Haley Kerrigan; Shermineh Rostami Fairchild; Martin Richardson
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Paper Abstract

Single-shot ablation of GaAs samples by a collinear femtosecond-nanosecond (fs-ns) dual-pulse is investigated. Significantly enhanced material removal is achieved by optimally combining a single 8 ns pulse at 1064 nm and a single 50 fs pulse at 800 nm in time. The resulting ablation craters are examined for inter-pulse delays ranging from -50 ns (ns first) to +1 μs (fs first) as well as very long delays of ±30 s. Crater profilometry is conducted with white light interferometry and optical microscopy to determine the volume of ablated material and identify surface features that reveal information about the physical mechanism of material removal during fs-ns dual-pulse ablation.

Paper Details

Date Published: 19 February 2018
PDF: 8 pages
Proc. SPIE 10522, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVIII, 105221I (19 February 2018); doi: 10.1117/12.2290062
Show Author Affiliations
Haley Kerrigan, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
Shermineh Rostami Fairchild, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
Florida Institute of Technology (United States)
Martin Richardson, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 10522:
Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVIII
Peter R. Herman; Michel Meunier; Roberto Osellame, Editor(s)

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