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Proceedings Paper

Piezo-based motion stages for heavy duty operation in clean environments
Author(s): Nir Karasikov; Gal Peled; Roman Yasinov; Michael Gissin; Alan Feinstein
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Paper Abstract

A range of heavy duty, ultra-precise motion stages had been developed for precise positioning in semiconductor manufacturing and metrology, for use in a clean room and high vacuum (HV and UHV) environments, to meet the precision requirements for 7, 5 nm nodes and beyond. These stages are powered by L1B2 direct drive ultrasonic motors, which allows combining long motion range, sub-nanometer positioning accuracy, high stiffness (in the direction of motion), low power consumption and active compensation of thermal and structural drift while holding position. The mechanical design, material selection for clean room and high vacuum preparation techniques are reviewed. Test results in a clean room are reported for a two-axis (X-Y) stage, having a load capacity of 30 kg, a motion range of 450 mm, a positioning accuracy of < 1 nm, a maximum motion speed of > 200 mm/s and a < 2 nm position stability (3 sigma). Long term drift compensation to sub-nm level, against thermal drift, has been validated for more than 10 hours.

Heavy duty operation in a high vacuum is exemplified via a single axis stage operating at 5E-7 Torr, having a moving mass of 0.96 kg, oriented against gravity. The stage is operated periodically (up and down) over a travel length of 45 mm. The motion profile has a trapezoidal shape with an acceleration of 1m/s2 and a constant velocity of 100 mm/s. The operational parameters (average absolute position error during constant velocity, motor force, dead zone level) remain stable over more than 370000 passes (experiment duration).

Paper Details

Date Published: 22 February 2018
PDF: 11 pages
Proc. SPIE 10539, Photonic Instrumentation Engineering V, 105390Q (22 February 2018); doi: 10.1117/12.2289804
Show Author Affiliations
Nir Karasikov, Nanomotion Inc. (United States)
Gal Peled, Nanomotion Ltd. (United States)
Roman Yasinov, Nanomotion Inc. (United States)
Michael Gissin, Nanomotion Inc. (United States)
Alan Feinstein, Nanomotion Inc. (United States)

Published in SPIE Proceedings Vol. 10539:
Photonic Instrumentation Engineering V
Yakov G. Soskind, Editor(s)

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