Share Email Print
cover

Proceedings Paper

Simple scalable fabrication method of wide-angle black silicon surface for energy-harvesting applications
Author(s): Abdelaziz M. Gouda; Nageh K. Allam; Mohamed A. Swillam
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In this study, we report an easy and cheap fabrication technique of wide band omnidirectional antireflective black silicon surface based on porous and non-porous silicon nanowires (SINWs). This technique depends on one step silver electroless catalytic etching method (EMACE) in an aqueous solution of AgNO3 and HF. We found a commensurate relationship between the dimensions and the etching time. The fabrication technique was examined for large scale production potential. Wide band and angle near zero reflection is reported in the visible region due to the strong trapping and antireflection properties. Quantum size effect and phonon scattering is confirmed for the fabricated structure through Raman measurement. Black silicon based on porous and non-porous SINWs shows promising potential for photovoltaic, optoelectronic and energy storage applications.

Paper Details

Date Published: 16 February 2018
PDF: 6 pages
Proc. SPIE 10527, Physics, Simulation, and Photonic Engineering of Photovoltaic Devices VII, 105270V (16 February 2018); doi: 10.1117/12.2289155
Show Author Affiliations
Abdelaziz M. Gouda, American Univ. in Cairo (Egypt)
Ain Shams Univ. (Egypt)
Nageh K. Allam, American Univ. in Cairo (Egypt)
Mohamed A. Swillam, American Univ. in Cairo (Egypt)


Published in SPIE Proceedings Vol. 10527:
Physics, Simulation, and Photonic Engineering of Photovoltaic Devices VII
Alexandre Freundlich; Laurent Lombez; Masakazu Sugiyama, Editor(s)

© SPIE. Terms of Use
Back to Top