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Proceedings Paper

CMOS compatible and fabrication tolerant polarization rotator based on oxide cladding partially etching
Author(s): Wenhao Wu; Yu Yu; Jiabi Xiong; Xinliang Zhang
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Proc. SPIE 10537, Silicon Photonics XIII, ; doi: 10.1117/12.2289115
Show Author Affiliations
Wenhao Wu, Wuhan National Lab. for Optoelectronics (China)
Yu Yu, Wuhan National Lab. for Optoelectronics (China)
Jiabi Xiong, Wuhan National Lab. for Optoelectronics (China)
Xinliang Zhang, Wuhan National Lab. for Optoelectronics (China)


Published in SPIE Proceedings Vol. 10537:
Silicon Photonics XIII
Graham T. Reed; Andrew P. Knights, Editor(s)

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