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Proceedings Paper

Investigation on gas medium parameters for an ArF excimer laser through orthogonal experimental design
Author(s): Xingliang Song; Pengfei Sha; Yuanyuan Fan; R. Jiang; Jiangshan Zhao; Yi Zhou; Junhong Yang; Guangliang Xiong; Yu Wang
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Paper Abstract

Due to complex kinetics of formation and loss mechanisms, such as ion-ion recombination reaction, neutral species harpoon reaction, excited state quenching and photon absorption, as well as their interactions, the performance behavior of different laser gas medium parameters for excimer laser varies greatly. Therefore, the effects of gas composition and total gas pressure on excimer laser performance attract continual research studies. In this work, orthogonal experimental design (OED) is used to investigate quantitative and qualitative correlations between output laser energy characteristics and gas medium parameters for an ArF excimer laser with plano-plano optical resonator operation. Optimized output laser energy with good pulse to pulse stability can be obtained effectively by proper selection of the gas medium parameters, which makes the most of the ArF excimer laser device. Simple and efficient method for gas medium optimization is proposed and demonstrated experimentally, which provides a global and systematic solution. By detailed statistical analysis, the significance sequence of relevant parameter factors and the optimized composition for gas medium parameters are obtained. Compared with conventional route of varying single gas parameter factor sequentially, this paper presents a more comprehensive way of considering multivariables simultaneously, which seems promising in striking an appropriate balance among various complicated parameters for power scaling study of an excimer laser.

Paper Details

Date Published: 15 February 2018
PDF: 6 pages
Proc. SPIE 10511, Solid State Lasers XXVII: Technology and Devices, 105112L (15 February 2018); doi: 10.1117/12.2288946
Show Author Affiliations
Xingliang Song, Academy of Opto-Electronics (China)
Univ. of Chinese Academy of Sciences (China)
Beijing RSLaser Opto-Electronics Technology Co., Ltd. (China)
Pengfei Sha, Academy of Opto-Electronics (China)
Beijing RSLaser Opto-Electronics Technology Co., Ltd. (China)
Yuanyuan Fan, Academy of Opto-Electronics (China)
R. Jiang, Academy of Opto-Electronics (China)
Beijing RSLaser Opto-Electronics Technology Co., Ltd. (China)
Jiangshan Zhao, Academy of Opto-Electronics (China)
Beijing RSLaser Opto-Electronics Technology Co., Ltd. (China)
Yi Zhou, Academy of Opto-Electronics (China)
Beijing RSLaser Opto-Electronics Technology Co., Ltd. (China)
Junhong Yang, Beijing RSLaser Opto-Electronics Technology Co., Ltd. (China)
Guangliang Xiong, Beijing RSLaser Opto-Electronics Technology Co., Ltd. (China)
Yu Wang, Academy of Opto-Electronics (China)


Published in SPIE Proceedings Vol. 10511:
Solid State Lasers XXVII: Technology and Devices
W. Andrew Clarkson; Ramesh K. Shori, Editor(s)

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