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Proceedings Paper

Improvement of conversion efficiency of DUV light generation at 221-nm using CLBO crystal
Author(s): Hironori Igarashi; Zhigang Zhao; Hongwen Xuan; Chen Qu; Shinji Ito; Yuki Tamaru; Mitsuru Tamiya; Taisuke Miura; Junichi Fujimoto; Hakaru Mizoguchi; Yohei Kobayashi
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Paper Abstract

We are developing a 100-W level DUV light source using a solid-state seed laser and an ArF amplifier. Seed pulse at 193nm is generated by the sum frequency mixing of the pulse at 221nm and the pulse at 1553nm using CLBO crystals. To realize a compact and robust seed laser, we improved the conversion efficiency of DUV light generation. In case of the 221nm pulse generation, the conversion efficiency was increased from 22% to nearly 50% by optimizing the conversion process which enables the reduction of amplifier unit of fundamental light source to obtain the 1W seed pulse at 193nm.

Paper Details

Date Published: 15 February 2018
PDF: 7 pages
Proc. SPIE 10516, Nonlinear Frequency Generation and Conversion: Materials and Devices XVII, 1051602 (15 February 2018); doi: 10.1117/12.2287675
Show Author Affiliations
Hironori Igarashi, Gigaphoton Inc. (Japan)
Zhigang Zhao, The Univ. of Tokyo (Japan)
Hongwen Xuan, The Univ. of Tokyo (Japan)
Chen Qu, Gigaphoton Inc. (Japan)
Shinji Ito, The Univ. of Tokyo (Japan)
Yuki Tamaru, Gigaphoton Inc. (Japan)
Mitsuru Tamiya, Gigaphoton Inc. (Japan)
Taisuke Miura, Gigaphoton Inc. (Japan)
Junichi Fujimoto, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)
Yohei Kobayashi, The Univ. of Tokyo (Japan)


Published in SPIE Proceedings Vol. 10516:
Nonlinear Frequency Generation and Conversion: Materials and Devices XVII
Konstantin L. Vodopyanov; Kenneth L. Schepler, Editor(s)

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