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Proceedings Paper

Ultrafast dynamics of material excitation of dielectrics with ultrashort pulsed Bessel beams
Author(s): C. Kalupka; T. Holtum; M. Reininghaus
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Paper Abstract

We report on the dynamics of the excitation process of dielectrics using a spatial Bessel beam intensity distribution with pulse durations below 10 ps. The generated free-electron plasma is analyzed by time-resolved transversal pump-probe shadowgraphy on a timescale up to 20 ps after initial excitation. Our measurements reveal the ultrafast generation of the free-electron plasma, which reaches a maximum after approximately 10 ps. The subsequent relaxation is comparable slow with a time constant in the range of 100 ps. We perform measurements with different pump pulse durations in the range from 0.1 ps up to 9 ps and observe that the spatial distribution of the generated free-electron plasma strongly depends on the pulse duration and pulse energy. Our results show that the spatial distribution of the free-electron plasma can be controlled by a coarse adjustment of the pulse parameters. The understanding of the correlation of the spatial energy deposition and pulse parameters is useful for a high precision and fast glass cutting process.

Paper Details

Date Published: 19 February 2018
PDF: 8 pages
Proc. SPIE 10520, Laser-based Micro- and Nanoprocessing XII, 105200G (19 February 2018); doi: 10.1117/12.2287337
Show Author Affiliations
C. Kalupka, Fraunhofer-Institut für Lasertechnik (Germany)
T. Holtum, RWTH Aachen Univ. (Germany)
M. Reininghaus, Fraunhofer-Institut für Lasertechnik (Germany)


Published in SPIE Proceedings Vol. 10520:
Laser-based Micro- and Nanoprocessing XII
Udo Klotzbach; Kunihiko Washio; Rainer Kling, Editor(s)

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