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Image based method for aberration measurement of lithographic tools
Author(s): Shuang Xu; Bo Tao; Yongxing Guo; Gongfa Li
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Paper Abstract

Information of lens aberration of lithographic tools is important as it directly affects the intensity distribution in the image plane. Zernike polynomials are commonly used for a mathematical description of lens aberrations. Due to the advantage of lower cost and easier implementation of tools, image based measurement techniques have been widely used. Lithographic tools are typically partially coherent systems that can be described by a bilinear model, which entails time consuming calculations and does not lend a simple and intuitive relationship between lens aberrations and the resulted images. Previous methods for retrieving lens aberrations in such partially coherent systems involve through-focus image measurements and time-consuming iterative algorithms. In this work, we propose a method for aberration measurement in lithographic tools, which only requires measuring two images of intensity distribution. Two linear formulations are derived in matrix forms that directly relate the measured images to the unknown Zernike coefficients. Consequently, an efficient non-iterative solution is obtained.

Paper Details

Date Published: 12 January 2018
PDF: 8 pages
Proc. SPIE 10620, 2017 International Conference on Optical Instruments and Technology: Optoelectronic Imaging/Spectroscopy and Signal Processing Technology, 106200C (12 January 2018); doi: 10.1117/12.2287057
Show Author Affiliations
Shuang Xu, Wuhan Univ. of Science and Technology (China)
Bo Tao, Wuhan Univ. of Science and Technology (China)
Yongxing Guo, Wuhan Univ. of Science and Technology (China)
Gongfa Li, Wuhan Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 10620:
2017 International Conference on Optical Instruments and Technology: Optoelectronic Imaging/Spectroscopy and Signal Processing Technology
Guohai Situ; Xun Cao; Wolfgang Osten; Liquan Dong, Editor(s)

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