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Proceedings Paper

Improving piezo actuators for nanopositioning tasks
Author(s): Martin Seeliger; Vassil Gramov; Bernt Götz
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Paper Abstract

In recent years, numerous applications emerged on the market with seemingly contradicting demands. On one side, the structure size decreased while on the other side, the overall sample size and speed of operation increased. Although the principle usage of piezoelectric positioning solutions has become a standard in the field of micro- and nanopositioning, surface inspection and manipulation, piezosystem jena now enhanced the performance beyond simple control loop tuning and actuator design.

In automated manufacturing machines, a given signal has to be tracked fast and precise. However, control systems naturally decrease the ability to follow this signal in real time. piezosystem jena developed a new signal feed forward system bypassing the PID control. This way, we could reduce signal tracking errors by a factor of three compared to a conventionally optimized PID control.

Of course, PID-values still have to be adjusted to specific conditions, e.g. changing additional mass, to optimize the performance. This can now be done with a new automatic tuning tool designed to analyze the current setup, find the best fitting configuration, and also gather and display theoretical as well as experimental performance data. Thus, the control quality of a mechanical setup can be improved within a few minutes without the need of external calibration equipment. Furthermore, new mechanical optimization techniques that focus not only on the positioning device, but also take the whole setup into account, prevent parasitic motion down to a few nanometers.

Paper Details

Date Published: 19 February 2018
PDF: 6 pages
Proc. SPIE 10520, Laser-based Micro- and Nanoprocessing XII, 105201E (19 February 2018); doi: 10.1117/12.2286894
Show Author Affiliations
Martin Seeliger, piezosystem jena GmbH (Germany)
Vassil Gramov, piezosystem jena GmbH (Germany)
Bernt Götz, piezosystem jena GmbH (Germany)


Published in SPIE Proceedings Vol. 10520:
Laser-based Micro- and Nanoprocessing XII
Udo Klotzbach; Kunihiko Washio; Rainer Kling, Editor(s)

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