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Proceedings Paper

Complex investigations of the photoresist layer's formation in microlithography
Author(s): Alexander G. Shapiro
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Paper Abstract

Creation of the elements with minimum 1 i near dimensions demands of the presence of definite knowledges about photoresist's behavior dunngal 1 technological process and about any element of the equipment and it's influence on photoresist 1 ayer.

Paper Details

Date Published: 1 November 1990
PDF: 8 pages
Proc. SPIE 1334, Current Developments in Optical Engineering IV, (1 November 1990); doi: 10.1117/12.22854
Show Author Affiliations
Alexander G. Shapiro, Moscow Aircraft Technology Institute (United States)

Published in SPIE Proceedings Vol. 1334:
Current Developments in Optical Engineering IV
Robert E. Fischer; Warren J. Smith, Editor(s)

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