Share Email Print

Proceedings Paper

Complex investigations of the photoresist layer's formation in microlithography
Author(s): Alexander G. Shapiro
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Creation of the elements with minimum 1 i near dimensions demands of the presence of definite knowledges about photoresist's behavior dunngal 1 technological process and about any element of the equipment and it's influence on photoresist 1 ayer.

Paper Details

Date Published: 1 November 1990
PDF: 8 pages
Proc. SPIE 1334, Current Developments in Optical Engineering IV, (1 November 1990); doi: 10.1117/12.22854
Show Author Affiliations
Alexander G. Shapiro, Moscow Aircraft Technology Institute (United States)

Published in SPIE Proceedings Vol. 1334:
Current Developments in Optical Engineering IV
Robert E. Fischer; Warren J. Smith, Editor(s)

© SPIE. Terms of Use
Back to Top