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Proceedings Paper

Research on the influence of baffle in luminous flux measurement with integrating sphere
Author(s): Fangsheng Lin; Tiecheng Li; Biyong Huang; Dejin Yin; Muyao Ji; Lei Lai; Ming Xia
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Paper Abstract

In the field of optical metrology, luminous flux is an important index to characterize the quality of light source. There are two kinds of method to measure it that one is light distribution surface method and the other is integrating sphere method. In the integrating sphere method, the baffle which is a key part of integrating sphere has important effects on the measurement results. The paper analyzes in detail the principle of an ideal integrating sphere. We change the relative position and shape of baffle inside the sphere during testing. By experiments, measured luminous flux values at different distances between the light source and baffle are obtained, which we used to take analysis of the effects of different baffle position and shape on the measurement. And then we obtain the optimum position and shape of baffle for luminous flux measurements. Based on the conclusion, we develop the methods and apparatus to improve the luminous flux measurement accuracy and reliability, which makes our unifying and transferring work of the luminous flux more accurate in East China and provides effective protection for our traceability system

Paper Details

Date Published: 24 October 2017
PDF: 6 pages
Proc. SPIE 10460, AOPC 2017: Optoelectronics and Micro/Nano-Optics, 104600X (24 October 2017); doi: 10.1117/12.2284390
Show Author Affiliations
Fangsheng Lin, Shanghai Institute of Measurement and Testing Technology (China)
Tiecheng Li, Shanghai Institute of Measurement and Testing Technology (China)
Biyong Huang, Shanghai Institute of Measurement and Testing Technology (China)
Dejin Yin, Shanghai Institute of Measurement and Testing Technology (China)
Muyao Ji, Shanghai Institute of Measurement and Testing Technology (China)
Lei Lai, Shanghai Institute of Measurement and Testing Technology (China)
Ming Xia, Shanghai Institute of Measurement and Testing Technology (China)


Published in SPIE Proceedings Vol. 10460:
AOPC 2017: Optoelectronics and Micro/Nano-Optics
Min Qiu; Min Gu; Xiaocong Yuan; Zhiping Zhou, Editor(s)

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