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Measurement of steep aspheric surfaces using improved two-wavelength phase-shifting interferometer
Author(s): Liqiong Zhang; Shaopu Wang; Yao Hu; Qun Hao
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Paper Abstract

Optical components with aspheric surfaces can improve the imaging quality of optical systems, and also provide extra advantages such as lighter weight, smaller volume and simper structure. In order to satisfy these performance requirements, the surface error of aspheric surfaces, especially high departure aspheric surfaces must be measured accurately and conveniently. The major obstacle of traditional null-interferometry for aspheric surface under test is that specific and complex null optics need to be designed to fully compensate for the normal aberration of the aspheric surface under test. However, non-null interferometry partially compensating for the aspheric normal aberration can test aspheric surfaces without specific null optics. In this work, a novel non-null test approach of measuring the deviation between aspheric surfaces and the best reference sphere by using improved two-wavelength phase shifting interferometer is described. With the help of the calibration based on reverse iteration optimization, we can effectively remove the retrace error and thus improve the accuracy. Simulation results demonstrate that this method can measure the aspheric surface with the departure of over tens of microns from the best reference sphere, which introduces approximately 500λ of wavefront aberration at the detector.

Paper Details

Date Published: 24 October 2017
PDF: 9 pages
Proc. SPIE 10458, AOPC 2017: 3D Measurement Technology for Intelligent Manufacturing, 104580Z (24 October 2017); doi: 10.1117/12.2284306
Show Author Affiliations
Liqiong Zhang, Beijing Institute of Technology (China)
Shaopu Wang, Beijing Institute of Technology (China)
Yao Hu, Beijing Institute of Technology (China)
Qun Hao, Beijing Institute of Technology (China)


Published in SPIE Proceedings Vol. 10458:
AOPC 2017: 3D Measurement Technology for Intelligent Manufacturing
Wolfgang Osten; Anand Krishna Asundi; Huijie Zhao, Editor(s)

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