Share Email Print

Proceedings Paper

Photoresist technology for 0.25 um lithography
Author(s): Will Conley
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

It's has been the general opinion of device manufacturers that deep ultraviolet imaging will be the imaging method required to produce 250nm and sub-250nm geometry's for 256Mb-DRAM's and related logic technology. Traditional Mine lithography may not capable of manufacturing at these geometry's and the use of deep UV radiation with "chemically amplified" photoresists will be required for these device programs. Issues regarding the problems that researchers are combating or have not yet considered in the evolutionary chain of deep ultraviolet photoresist development and implementation will be discussed. As researchers continue developing environmentally stable materials, there is a series of issues that device manufacturers need to resolve today as new quarter micron fabs are currently under construction. Fab designers may need to consider additional space for specialty tools or processes in order to produce quarter micron lithography. The issues concerning materials, process, reflectivity control, manufacturing facilities, quality control, photoresist manufacturing, photoresist cost and a proposed roadmap for the next several years of development will be discussed. The author will also provide a brief overview of current Mine photoresists and their capability to the 300nm geometry region along with some basic chemistry regarding the principles of DNQ's and chemically amplified photoresists.

Paper Details

Date Published: 30 August 2017
PDF: 40 pages
Proc. SPIE 10321, Single Frequency Semiconductor Lasers, 1032103 (30 August 2017); doi: 10.1117/12.2284082
Show Author Affiliations
Will Conley, IBM Corp. (United States)

Published in SPIE Proceedings Vol. 10321:
Single Frequency Semiconductor Lasers
Jens Buus, Editor(s)

© SPIE. Terms of Use
Back to Top