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Proceedings Paper

Future lithography technology
Author(s): Gene Fuller
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Paper Abstract

Introduction-Lithography is the key enabler for semiconductor manufacturing. Future Progress in circuit scaling depends on contrinued progress in lithography capability scaling. Lithograph is once again approaching a "barrier" where exisiting technology does not demonstrate a clear path for continued progress. We will explore some continuities and discontinuities in lithography that promise to drive the scaling process for many years.

Paper Details

Date Published: 30 August 2017
PDF: 64 pages
Proc. SPIE 10320, An Introduction to Biological and Artificial Neural Networks for Pattern Recognition, 1032005 (30 August 2017); doi: 10.1117/12.2284078
Show Author Affiliations
Gene Fuller, Texas Instruments (United States)


Published in SPIE Proceedings Vol. 10320:
An Introduction to Biological and Artificial Neural Networks for Pattern Recognition
Steven K. Rogers; Matthew Kabrisky, Editor(s)

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