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Lithography equipment: what is out there and what is coming
Author(s): Harry J. Levinson
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Paper Abstract

Lithography equipment is undergoing some of the most significant changes since the introduction of the wafer stepper. The driving force behind these changes is the diffraction limit of optics. The resulting characteristics of new lithography equipment, to contend with the diffraction limit, are discussed. The high cost of lithography equipment has made mix-and-match lithography commonplace. Step-and-scan technology is the wave of the near-future, as a way to contend with the difficulty of manufacturing wide-field lenses. Resist processing equipment will undergoing few changes, but will often be integrated with steppers. Metrology is being stretched to its limits for technologies below 250 nm.

Paper Details

Date Published: 30 August 2017
PDF: 20 pages
Proc. SPIE 10320, An Introduction to Biological and Artificial Neural Networks for Pattern Recognition, 1032002 (30 August 2017); doi: 10.1117/12.2284075
Show Author Affiliations
Harry J. Levinson, Advanced Micro Devices (United States)


Published in SPIE Proceedings Vol. 10320:
An Introduction to Biological and Artificial Neural Networks for Pattern Recognition
Steven K. Rogers; Matthew Kabrisky, Editor(s)

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