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Proceedings Paper

Metrology challenges of thin optical wafers for high finesse etalons
Author(s): Jan Burke
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Paper Abstract

We present a number of measurement methods that we use in the fabrication of solid LiNbO3 etalons. Several unique technical features, such as high finesse, large aperture/high aspect ratio, and tunability, require careful monitoring of quality parameters throughout the production process. We point out the critical issues and how we monitor them.

Paper Details

Date Published: 19 May 2003
PDF: 3 pages
Proc. SPIE 10314, Optifab 2003: Technical Digest, 1031414 (19 May 2003); doi: 10.1117/12.2284029
Show Author Affiliations
Jan Burke, CSIRO Telecommunications & Industrial Physics (Australia)

Published in SPIE Proceedings Vol. 10314:
Optifab 2003: Technical Digest
Walter C. Czajkowski; Toshihide Dohi; Hans Lauth; Harvey M. Pollicove, Editor(s)

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