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Proceedings Paper

Development and demonstration of precision optical contouring by wet etch figuring
Author(s): J. A. Britten
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Paper Abstract

Wet etch figuring (WEF) utilizes surface tension gradients to confine and stabilize the footprint of an etchant solution contacting an optic, and uses real-time optical interferometry for closed-loop control the local dwell time of etchant on the optic. This enables precision figuring of arbitrary continuous contour optical shapes with gradients of up to 0.5 waves/ mm. This stress-free figuring method enables the figuring of ultrathin optics, and allows inexpensive thin sheet glass to become raw material for precision optics such as phase plates, aberration correctors and beam shapers. We present data on surfaces generated and discuss surface smoothness of optics manufactured by WEF.

Paper Details

Date Published: 19 May 2003
PDF: 3 pages
Proc. SPIE 10314, Optifab 2003: Technical Digest, 1031407 (19 May 2003); doi: 10.1117/12.2283996
Show Author Affiliations
J. A. Britten, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 10314:
Optifab 2003: Technical Digest
Walter C. Czajkowski; Toshihide Dohi; Hans Lauth; Harvey M. Pollicove, Editor(s)

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