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Proceedings Paper

Comparison of SiOxNy thin films deposited by ECR-PECVD at 2.4 and 3.0 mTorr total pressure
Author(s): Jacek Wojcik
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Paper Abstract

This paper examines the influence of the total pressure and the various gas flow rates on the composition of thin silicon - oxynitride films, as expressed through their refractive indexes. These aspects are highly relevant to producing high quality and reproducible films for optoelectronic applications.

Paper Details

Date Published: 29 August 2017
PDF: 3 pages
Proc. SPIE 10313, Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging, 103134V (29 August 2017); doi: 10.1117/12.2283971
Show Author Affiliations
Jacek Wojcik, McMaster Univ. (Canada)


Published in SPIE Proceedings Vol. 10313:
Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging
John C. Armitage, Editor(s)

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