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Proceedings Paper

Plasma-deposited inhomogeneous optical filters
Author(s): Stephane Larouche
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Paper Abstract

Plasma-enhanced chemical vapor deposition was used to deposit titanium dioxide (TiO2), silicon dioxide (SiO2) and Ti02/Si02 mixtures films with any index of refraction between 1.50 for SiO, and 2.35 for TiO2. We fabricated simple inhomogeneous and multilayer filters, namely rugate filters and quarter-wave stacks, as well as more sophisticated inhomogeneous filters, multiband rugate filters. We showed that inhomogeneous filters cause less light scattering than their multilayer counterparts.

Paper Details

Date Published: 29 August 2017
PDF: 3 pages
Proc. SPIE 10313, Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging, 103134S (29 August 2017); doi: 10.1117/12.2283968
Show Author Affiliations
Stephane Larouche, Ecole Polytechnique de Montreal (Canada)

Published in SPIE Proceedings Vol. 10313:
Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging
John C. Armitage, Editor(s)

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