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Proceedings Paper

Plasma-enhanced CVD Of W and Mo oxides
Author(s): D. K. Benson
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Paper Abstract

Recently a new technique for making electrochromic coatings has been presented. In the semiconductor industry, plasma enhanced chemical vapor deposition (PE-CVD) is routinely used to produce oxide and nitride coatings and photovoltaic a-Si devices . At the Solar Energy Research Institute the technique has now been developed to produce electrochromic coatings of tungsten and molybdenum oxidel-4 .The results are very promising and coatings show the same characteristics as tungsten and molybdenum oxides produced by evaporation. The main difference is that the coatings are produced at a much higher rate using PE-CVD. Deposition rates greater than 40 nm/s have been achieved for tungsten oxide. This points at the possibility to produce electrochromic devices at a more competitive price than with competing technologies.

Paper Details

Date Published: 28 March 1990
PDF: 15 pages
Proc. SPIE 10304, Large-Area Chromogenics: Materials and Devices for Transmittance Control, 103040D (28 March 1990); doi: 10.1117/12.2283616
Show Author Affiliations
D. K. Benson, Solar Energy Research Institute (United States)

Published in SPIE Proceedings Vol. 10304:
Large-Area Chromogenics: Materials and Devices for Transmittance Control
Carl M. Lampert; Claes-Göran Granqvist, Editor(s)

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