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Proceedings Paper

Design of photolithographic lenses with large field and approximate bitelecentricity
Author(s): Xiaocai Wang; Dajian Lin
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Paper Abstract

This paper introduced a new type of tenses with approximate bite lecentricity for photolithography.It has the quasi-diffraction Limited image quality in the range of large field size and keeps fine overlay accuracy as well.The corrections of sagittal aberrations and higher order aberrations are considered in the optical design. Finaty, the MTF of two results, with NAO•2, magnification x, field diameter 140mm, and NAO•28, magnification lOX, field diameter 140mm, were given.

Paper Details

Date Published: 1 November 1990
PDF: 7 pages
Proc. SPIE 1334, Current Developments in Optical Engineering IV, (1 November 1990); doi: 10.1117/12.22836
Show Author Affiliations
Xiaocai Wang, Institute of Optics and Electronics (China)
Dajian Lin, Institute of Optics and Electr (China)


Published in SPIE Proceedings Vol. 1334:
Current Developments in Optical Engineering IV
Robert E. Fischer; Warren J. Smith, Editor(s)

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