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Proceedings Paper

Multi-beam mask writer MBM-1000
Author(s): Hiroshi Matsumoto; Hiroshi Yamashita; Takao Tamura; Kenji Ohtoshi
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Paper Abstract

Multi-beam mask writer MBM-1000 will be released in Q4 2017 for N5 semiconductor production. Performance of MBM-1000 is under verification and tuning by using alpha tool upgraded to high-volume manufacturing (HVM) system. It is designed to realize better resolution and higher throughput than EBM-9500, our latest variable-shaped-beam writer, at shot count higher than 500 Gshot/pass. Writing test after upgrade confirmed that MBM-1000 has better beam resolution than EBM-9500 as expected by optics design. It also showed that position of beam array projected on target was stable during one hour writing enough to accomplish registration target. Design of data transfer system and BAA for 300-Gbps data rate is described.

Paper Details

Date Published: 13 July 2017
PDF: 6 pages
Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540E (13 July 2017); doi: 10.1117/12.2283033
Show Author Affiliations
Hiroshi Matsumoto, NuFlare Technology, Inc. (Japan)
Hiroshi Yamashita, NuFlare Technology, Inc. (Japan)
Takao Tamura, NuFlare Technology, Inc. (Japan)
Kenji Ohtoshi, NuFlare Technology, Inc. (Japan)


Published in SPIE Proceedings Vol. 10454:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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