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Proceedings Paper

Machine learning of IC layout "styles" for Mask Data Processing verification and optimization
Author(s): Luigi Capodieci
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Date Published:
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Proc. SPIE 10451, Photomask Technology, ; doi: 10.1117/12.2282885
Show Author Affiliations
Luigi Capodieci, Motivo Data Analytics (United States)


Published in SPIE Proceedings Vol. 10451:
Photomask Technology
Peter D. Buck; Emily E. Gallagher, Editor(s)

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