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Proceedings Paper

Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices
Author(s): Ivo W. Rangelow; Claudia Lenk ; Martin Hofmann ; Tzvetan Ivanov; Steve Lenk; Elshad Guliyev; Marcus Kaestner; Cemal Aydogan; Mahmut Bicer; B. Erdem Alaca; Onur Ates; Hamdi Torun; Arda D. Yalcinkaya; Ahmad Ahmad; Alexander Reum; Mathias Holz
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Paper Abstract

Next-generation electronic and optical devices demand high-resolution patterning techniques and high-throughput fabrication. Thereby Field-Emission Scanning Probe Lithography (FE-SPL) is a direct writing method that provides high resolution, excellent overlay alignment accuracy and high fidelity nanopatterns. As a demonstration of the patterning technology, single-electron transistors as well as split ring electromagnetic resonators are fabricated through a combination of FE-SPL and plasma etching at cryogenic temperatures.

Paper Details

Date Published: 31 January 2018
PDF: 10 pages
Proc. SPIE 10456, Nanophotonics Australasia 2017, 1045621 (31 January 2018); doi: 10.1117/12.2282606
Show Author Affiliations
Ivo W. Rangelow, Technische Univ. Ilmenau (Germany)
Claudia Lenk , Technische Univ. Ilmenau (Germany)
Martin Hofmann , Technische Univ. Ilmenau (Germany)
Tzvetan Ivanov, Technische Univ. Ilmenau (Germany)
Steve Lenk, Technische Univ. Ilmenau (Germany)
Elshad Guliyev, Technische Univ. Ilmenau (Germany)
Marcus Kaestner, Technische Univ. Ilmenau (Germany)
Cemal Aydogan, Technische Univ. Ilmenau (Germany)
TUBITAK - YITAL (Turkey)
Mahmut Bicer, Koç Univ. (Turkey)
B. Erdem Alaca, Koç Univ. (Turkey)
Onur Ates, Bogazici Univ. (Turkey)
Hamdi Torun, Bogaziçi Univ. (Turkey)
Arda D. Yalcinkaya, Boğaziçi Univ. (Turkey)
Ahmad Ahmad, Nanoanalytik GmbH (Germany)
Alexander Reum, Nanoanalytik GmbH (Germany)
Mathias Holz, Nanoanalytik GmbH (Germany)


Published in SPIE Proceedings Vol. 10456:
Nanophotonics Australasia 2017
James W. M. Chon; Baohua Jia, Editor(s)

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